Most such instruments use a quartz crystal microbalance as the sensor. Optical measurements are sometimes used; this may be especially appropriate if the film being deposited is part of a thin film optical device.
A thickness monitor measures how much material deposited on its sensor. Most deposition processes are at least somewhat directional. The sensor and the sample generally cannot be in the same direction from the deposition source (if they were, the one closer to the source would shadow the other), and may not even be at the same distance from it. Therefore, the rate at which the material is deposited on the sensor may not equal the rate at which it is deposited on the sample. The ratio of the two rates is sometimes called the "tooling factor". For careful work, the tooling factor should be checked by measuring the amount of material deposited on some samples after the fact and comparing it to what the thickness monitor measured. Fizeau interferometers are often used to do this. Many other techniques might be used, depending on the thickness and characteristics of the thin film, including surface profilers, ellipsometry, and scanning electron microscopy of cross-sections of the sample. Many thickness monitors and controllers allow tooling factors to be entered into the device before deposition begins.
References
- Milton Ohring (2001). The Materials Science of Thin Films, 2nd edition. Academic Press. ISBN 0-12-524975-6
External links
This article is licensed under the GNU Free Documentation License.
Last updated on Tuesday June 26, 2007 at 12:09:06 PDT (GMT -0700)
View this article at Wikipedia.org - Edit this article at Wikipedia.org - Donate to the Wikimedia Foundation
Copyright © 2008, Dictionary.com, LLC. All rights reserved.













