The candidates for next-generation lithography include: high-index immersion lithography, extreme ultraviolet lithography (EUV-lithography), X-ray lithography, electron beam lithography, focused ion beam lithography and nanoimprint lithography.
These techniques, together with photolithography, share one fundamental characteristic: etching of polymer (resist) as the last step. Ultimately the quality (roughness) as well as resolution of this polymer etching limits the inherent resolution of the lithography technique.
See also
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Last updated on Friday November 02, 2007 at 21:58:04 PDT (GMT -0700)
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The candidates for next-generation lithography include: high-index immersion lithography, extreme ultraviolet lithography (EUV-lithography), X-ray lithography, electron beam lithography, focused ion beam lithography and nanoimprint lithography.
These techniques, together with photolithography, share one fundamental characteristic: etching of polymer (resist) as the last step. Ultimately the quality (roughness) as well as resolution of this polymer etching limits the inherent resolution of the lithography technique.
See also
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