DPN enables direct deposition of nanoscale materials onto a substrate in a flexible manner. The vehicle for deposition can include pyramidal scanning probe microscope tips, hollow tips, and even tips on thermally actuated cantilevers. Recent advances have demonstrated massively parallel patterning using two-dimensional arrays of 55,000 tips, depicted below. Applications of this technology currently range through chemistry, materials science, and the life sciences, and include such work as ultra high density biological nanoarrays, additive photomask repair, and brand protection for pharmaceuticals.
The technique was developed in 1999 by a research group at Northwestern University led by Chad Mirkin 
The company NanoInk, Inc. holds a patent on Dip Pen Nanolithography, and "DPN" and "Dip Pen Nanolithography" are trademarks or registered trademarks of NanoInk.
References
- Piner, R. D.; Zhu, J.; Xu, F.; Hong, S.; Mirkin, C. A. "Dip Pen Nanolithography," Science, 1999, 283, 661-663.
- Science, 2002, 295, 1702-1705 DOI: 10.1126/science.1067172
- Dip Pen Nanolithography subgroup at Northwestern University
See also
- Nanolithography
- Scanning probe lithography
- Atomic force microscope
- NanoInk DPN
- DPN Research News
- dpnforum, a public discussion board and Dip Pen Nanolithography resource
This article is licensed under the GNU Free Documentation License.
Last updated on Tuesday June 10, 2008 at 12:49:48 PDT (GMT -0700)
View this article at Wikipedia.org - Edit this article at Wikipedia.org - Donate to the Wikimedia Foundation
DPN enables direct deposition of nanoscale materials onto a substrate in a flexible manner. The vehicle for deposition can include pyramidal scanning probe microscope tips, hollow tips, and even tips on thermally actuated cantilevers. Recent advances have demonstrated massively parallel patterning using two-dimensional arrays of 55,000 tips, depicted below. Applications of this technology currently range through chemistry, materials science, and the life sciences, and include such work as ultra high density biological nanoarrays, additive photomask repair, and brand protection for pharmaceuticals.
The technique was developed in 1999 by a research group at Northwestern University led by Chad Mirkin The company NanoInk, Inc. holds a patent on Dip Pen Nanolithography, and "DPN" and "Dip Pen Nanolithography" are trademarks or registered trademarks of NanoInk.
References
- Piner, R. D.; Zhu, J.; Xu, F.; Hong, S.; Mirkin, C. A. "Dip Pen Nanolithography," Science, 1999, 283, 661-663.
- Science, 2002, 295, 1702-1705 DOI: 10.1126/science.1067172
- Dip Pen Nanolithography subgroup at Northwestern University
See also
- Nanolithography
- Scanning probe lithography
- Atomic force microscope
- NanoInk DPN
- DPN Research News
- dpnforum, a public discussion board and Dip Pen Nanolithography resource
This article is licensed under the GNU Free Documentation License.
Last updated on Tuesday June 10, 2008 at 12:49:48 PDT (GMT -0700)
View this article at Wikipedia.org - Edit this article at Wikipedia.org - Donate to the Wikimedia Foundation
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