The journal covers areas of process and equipment control, simulation and modeling from the factory to the detailed process level, defect control, yield analysis and optimization, production planning and scheduling, environmental issues in semiconductor manufacturing, manufacturability improvement.
It is a joint publication of
US Patent Issued to Seiko Epson on May 3 for "Method and System for Controlling Semiconductor Manufacturing Equipment" (Japanese Inventor)
May 05, 2011; ALEXANDRIA, Va., May 5 -- United States Patent no. 7,937,189, issued on May 3, was assigned to Seiko Epson Corp. (Japan). "Method...