Hexafluorosilicic acid is the chemical compound with the formula H2SiF6. The free acid is encountered as an equilibrium mixture with hexaflurorosilicate anion (SiF62−) only in solution in solvents that are proton donors at low pH. In aqueous solution, evaporation of H2SiF6 results in loss of HF and SiF4.
Aqueous solutions of H2SiF6 contain the hexafluorosilicate anion, SiF62−. In this octahedral anion, the Si-F bond distances are 1.71 Å.
H2SiF6 is a reagent in organic synthesis for cleaving Si-O bonds of silyl ethers. It is more reactive for this purpose than HF. It reacts faster with t-butyldimethysilyl (TBDMS) ethers than triisopropylsilyl (TIPS) ethers.
Hexafluorosilicic acid and the salts are used as wood preservation agents. The aluminium and magnesium hexafluorosilicate are two used compounds.
US Patent Issued to Construction Research & Technology on Aug. 21 for "Accelerator Mixture and Method of Use" (Swiss Inventors)
Aug 27, 2012; ALEXANDRIA, Va., Aug. 27 -- United States Patent no. 8,246,742, issued on Aug. 21, was assigned to Construction Research &...